Lectures In Plasma Physics


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Lectures in Plasma Physics


Lectures in Plasma Physics

Author: Claude Mercier

language: en

Publisher:

Release Date: 1987


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Plasma Physics: An Introductory Course


Plasma Physics: An Introductory Course

Author: R. O. Dendy

language: en

Publisher: Cambridge University Press

Release Date: 1995-02-24


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For the last thirty years, international summer schools in plasma physics have been held at Culham Laboratory, site of the Joint European Torus fusion project. This book has been developed from lectures given at these schools, and provides a wide-ranging introduction to the subject. The first few chapters deal with the fundamentals of plasma physics. In subsequent chapters, the applications and properties of man-made and naturally occurring plasmas are discussed. In addition, there are chapters devoted to general phenomena such as turbulence and chaos. The computational techniques employed in modelling plasma behaviour are also described. Since no prior knowledge of plasma physics is assumed, this book will act as an ideal introduction to the subject for final year undergraduates and beginning graduate students in physics, astronomy, mathematics and engineering.

Lecture Notes on Principles of Plasma Processing


Lecture Notes on Principles of Plasma Processing

Author: Francis F. Chen

language: en

Publisher: Springer Science & Business Media

Release Date: 2003-01-31


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Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.