X Ray Diffuse Scattering At Self Organized Mesoscopic Semiconductor Structures

X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures

This monograph represents a critical survey of the outstanding capabilities of X-ray diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers. It is of particular relevance at semiconductor layer systems where, for example, interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesoscopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine aspects of self-organized growth of mesoscopic structures with corresponding X-ray diffuse scattering experiments.

X-ray Diffuse Scattering at Self-organized Mesoscopic Semiconductor Structures

Diffuse Scattering and the Fundamental Properties of Materials

Annotation Beginning with a concise review of the physics and chemistry of polymers and their structure and morphology, this book goes on to describe and explain the common methods of characterizing polymers, including optical microscopy, scanning electron microscopy and transmission electron microscopy, among others. Also covered are the characterization and modification of such surface properties as adhesion, wetting, tribology, and surface thermodynamics.