Thin Films Atomic Layer Deposition And 3d Printing
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Thin Films, Atomic Layer Deposition, and 3D Printing
Thin Films, Atomic Layer Deposition, and 3D Printing explains the concept of thin films, atomic layers deposition, and the Fourth Industrial Revolution (4IR) with an aim to illustrate existing resources and give a broader perspective of the involved processes as well as provide a selection of different types of 3D printing, materials used for 3D printing, emerging trends and applications, and current top-performing 3D printers using different technologies. It covers the concept of the 4IR and its role in current and future human endeavors for both experts/nonexperts. The book includes figures, diagrams, and their applications in real-life situations. Features: Provides comprehensive material on conventional and emerging thin film, atomic layer, and additive technologies. Discusses the concept of Industry 4.0 in thin films technology. Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications. Explores detailed bibliometric analyses on pertinent applications. Interconnects atomic layer deposition and additive manufacturing. This book is aimed at researchers and graduate students in mechanical, materials, and metallurgical engineering.
Thin Film Deposition Techniques
This book describes the basics and historical aspects of thin film. The introductory chapter of this book contains various aspects about thin-film deposition methods, significance of nanomaterials in the fabrication of thin film, certain fundamental characteristics of thin films (electrical, optical, and morphological), some challenges (thickness uniformity, film adhesion issues, temperature-related challenges, film defects and quality control, preparation of the surface of the substrate before deposition, etc.) faced during the formation of thin film, significance, and different types of deposition techniques along with their basic introduction, working principle, construction, merits/demerits, and also application in specific fields. This book specifically works on the techniques of thin-film deposition and role of the thin film in the formation of these deposition methods.
Chemical Vapour Deposition
Author: Anthony C. Jones
language: en
Publisher: Royal Society of Chemistry
Release Date: 2009
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket