Structure And Properties Of Multilayered Thin Films Volume 382


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Structure and Properties of Multilayered Thin Films: Volume 382


Structure and Properties of Multilayered Thin Films: Volume 382

Author: Tai D. Nguyen

language: en

Publisher:

Release Date: 1995-11-10


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Layered thin film structures often have unusual properties which make them appealing in a wide range of applications. Fabrication of submicron and nanometer multilayers can produce metastable phases that many not be predicted from the bulk equilibrium phase diagrams. Understanding the growth, structure, stability and properties of multilayers, and controlling their microstructure through processing, are important in many applications. This book focuses on the relationship of structure and processing to the properties that are relevant to all researchers in the field of multilayers. Topics include: phase transformation and reaction kinetics; processing and growth; structural characterization; magnetic, electronic and optical properties; mechanical properties; X-ray optics; thin-film interfaces.

Silicide Thin Films: Volume 402


Silicide Thin Films: Volume 402

Author: Raymond T. Tung

language: en

Publisher:

Release Date: 1996


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Tremendous advances have been made in the use of silicides as contacts and interconnects in micro-electronic devices and as active layers in sensors. A flourish of novel fabrication concepts and characterization techniques has led to high-quality silicide devices and a better understanding of the electronic and micrometallurgical properties of their interfaces. However, the shrinking physical dimensions of ULSI devices beyond the deep submicron regime now poses new and serious materials challenges for the development of manufacturable silicide processes. Scientists and engineers from materials science, physics, chemistry, device, processing and other disciplines come together in this book to examine the current issues facing silicide thin-film applications. Topics include: silicide fundamentals - energetics and kinetics; processing of silicide thin films; ULSI issues; CVD silicides; semiconducting silicides; processing of germano-silicide thin films; silicides and analogs for IR detection; interfaces, surfaces and epitaxy; novel structures and techniques and properties of silicide thin films.