Reactor Design Optimization Based On Computational Modeling Of The Omvpe Process
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Reactor Design Optimization Based on Computational Modeling of the OMVPE Process
Organometallic vapor phase epitaxy (OMVPE) has been widely used to produce high quality thin films for semiconductor devices. In this thesis, fluid flow modeling approaches have been employed to investigate the OMVPE process in III/V compounds, and to optimize the growth conditions. Based on numerical simulations, a new showerhead reactor was designed to optimize growth rates and compositional uniformity. Numerical simulations of growth rate and growth rate uniformity were performed using fluid dynamics modeling codes, including the effects of gas phase diffusion. X-ray diffraction (XRD) analysis on InGaAs/GaAs samples grown in the new reactor chamber showed good agreement between experimental data and simulation results. It was demonstrated that very good growth and compositional uniformity, with non-uniformity as low as 1.2% and 0.5% respectively, can be achieved in our reactor even without high speed rotation. This may provide another approach for high quality thin film OMVPE growth in the future.
Optoelectronic Devices: III Nitrides
Tremendous progress has been made in the last few years in the growth, doping and processing technologies of the wide bandgap semiconductors. As a result, this class of materials now holds significant promis for semiconductor electronics in a broad range of applications. The principal driver for the current revival of interest in III-V Nitrides is their potential use in high power, high temperature, high frequency and optical devices resistant to radiation damage. This book provides a wide number of optoelectronic applications of III-V nitrides and covers the entire process from growth to devices and applications making it essential reading for those working in the semiconductors or microelectronics. - Broad review of optoelectronic applications of III-V nitrides
ICCGE-19/OMVPE-19 Program and Abstracts eBook
Author: ICCGE-19/OMVPE-19/AACG
language: en
Publisher: CTI Meeting Technology
Release Date: 2019-07-11
A collection of abstracts for the 19th International Conference on Crystal Growth and Epitaxy (ICCGE-19) to be held jointly with the 19th US Biennial Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-19) and the 17th International Summer School on Crystal Growth (ISSCG-17).