Rapid Reliability Assessment Of Vlsics


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Rapid Reliability Assessment of VLSICs


Rapid Reliability Assessment of VLSICs

Author: A.P. Dorey

language: en

Publisher: Springer Science & Business Media

Release Date: 2012-12-06


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The increasing application of integrated circuits in situations where high reliability is needed places a requirement on the manufacturer to use methods of testing to eliminate devices that may fail on service. One possible approach that is described in this book is to make precise electrical measurements that may reveal those devices more likely to fail. The measurements assessed are of analog circuit parameters which, based on a knowledge of failure mechanisms, may indicate a future failure. . To incorporate these tests into the functional listing of very large scale integrated circuits consideration has to be given to the sensitivity of the tests where small numbers of devices may be defective in a complex circuit. In addition the tests ideally should require minimal extra test time. A range of tests has been evaluated and compared with simulation used to assess the sensitivity of the measurements. Other work in the field is fully referenced at the end of each chapter. The team at Lancaster responsible for this book wish to thank the Alvey directorate and SERe for the necessary support and encouragement to publish our results. We would also like to thank John Henderson, recently retired from the British Telecom Research Laboratories, for his cheerful and enthusiastic encouragement. Trevor Ingham, now in New Zealand, is thanked for his early work on the project.

Advances in Electronics and Electron Physics


Advances in Electronics and Electron Physics

Author:

language: en

Publisher: Academic Press

Release Date: 1993-11-17


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Advances in Electronics and Electron Physics

The Physical Properties of Thin Metal Films


The Physical Properties of Thin Metal Films

Author: G.P. Zhigal'skii

language: en

Publisher: CRC Press

Release Date: 2003-07-10


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Thin films of conducting materials, such as metals, alloys and semiconductors are currently in use in many areas of science and technology, particularly in modern integrated circuit microelectronics that require high quality thin films for the manufacture of connection layers, resistors and ohmic contacts. These conducting films are also important for fundamental investigations in physics, radio-physics and physical chemistry. Physical Properties of Thin Metal Films provides a clear presentation of the complex physical properties particular to thin conducting films and includes the necessary theory, confirming experiments and applications. The volume will be an invaluable reference for graduates, engineers and scientists working in the electronics industry and fields of pure and applied science.