Quantitative Surface Analysis For Materials Science
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Quantitative Surface Analysis for Materials Science
Discusses the range of methods used to describe the structure, composition, and chemical nature of material surfaces, comparing the merits of each. The techniques standardly used in analytical laboratories auger electron and x-ray photoelectron spectroscopy, and secondary mass ion spectrometry are d
Surface Analysis Methods in Materials Science
Author: D.J. O'Connor
language: en
Publisher: Springer Science & Business Media
Release Date: 2013-06-29
The success of the first edition of this broad appeal book prompted the prepa ration of an updated and expanded second edition. The field of surface anal ysis is constantly changing as it answers the need to provide more specific and more detailed information about surface composition and structure in advanced materials science applications. The content of the second edition meets that need by including new techniques and expanded applications. Newcastle John O'Connor Clayton Brett Sexton Adelaide Roger Smart January 2003 Preface to the First Edition The idea for this book stemmed from a remark by Philip Jennings of Mur doch University in a discussion session following a regular meeting of the Australian Surface Science group. He observed that a text on surface anal ysis and applications to materials suitable for final year undergraduate and postgraduate science students was not currently available. Furthermore, the members of the Australian Surface Science group had the research experi ence and range of coverage of surface analytical techniques and applications to provide a text for this purpose. A list of techniques and applications to be included was agreed at that meeting. The intended readership of the book has been broadened since the early discussions, particularly to encompass industrial users, but there has been no significant alteration in content.
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science
Author: Siegfried Hofmann
language: en
Publisher: Springer Science & Business Media
Release Date: 2012-10-25
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.