Processes At The Semiconductor Solution Interface 4

Processes at the Semiconductor-Solution Interface 4

The symposium consisted of four half-day sessions on topics at the forefront of semiconductor electrochemistry and solution-based processing including etching, patterning, passivation, porosity formation, electrochemical film growth, energy conversion materials, deposition, semiconductor surface functionalization, photoelectrochemical and optical properties, and other related processes. This issue of ECS Transactions contains 18 of the papers presented including invited papers by H. Föll (Christian-Albrechts University Kiel), J. N. Chazalviel (Ecole Polytechnique, CNRS), D. N. Buckley (University of Limerick, and Past President, ECS), J. D. Holmes (University College Cork), E. Chassaing (IRDEP, EDF-CNRS-ENSCP).

Processes at the Semiconductor-solution Interface 4

Process Engineering for Pollution Control and Waste Minimization

Offers up-to-date technical information on current and potential pollution control and waste minimization practices, providing industry-specific case studies, techniques and models.