Principles Of Plasma Spectroscopy
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Principles of Plasma Spectroscopy
Author: Hans R. Griem
language: en
Publisher: Cambridge University Press
Release Date: 2005-02-17
This monograph presents a comprehensive description of the theoretical foundations and experimental applications of spectroscopic methods in plasma physics research. The first three chapters introduce the classical and quantum theory of radiation, with detailed descriptions of line strengths and high density effects. The next chapter describes theoretical and experimental aspects of spectral line broadening. The following five chapters are concerned with continuous spectra, level kinetics and cross sections, thermodynamic equilibrium relations, radiative energy transfer, and radiative energy losses. The book concludes with three chapters covering the basics of various applications of plasma spectroscopy to density and temperature measurements and to the determination of some other plasma properties. Over one thousand references not only guide the reader to original research covered in the chapters, but also to experimental details and instrumentation. This will be an important text and reference for all those working on plasmas in physics, optics, nuclear engineering, and chemistry, as well as astronomy, astrophysics and space physics.
Principles of Plasma Spectroscopy
Author: Hans R. Griem
language: en
Publisher: Cambridge University Press
Release Date: 1997-10-02
A comprehensive description of theoretical foundations and experimental applications of spectroscopic methods in plasmas. It covers the classical and quantum theory of radiation, spectral line broadening, continuous spectra, thermodynamic relations, radiative energy transfer and losses, and applications of plasma spectroscopy to measurements of densities, magnetic and electric fields, and temperatures.
Lecture Notes on Principles of Plasma Processing
Author: Francis F. Chen
language: en
Publisher: Springer Science & Business Media
Release Date: 2003-01-31
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.