Plasma Processes And Plasma Kinetics
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Plasma Kinetics in Atmospheric Gases
Author: M. Capitelli
language: en
Publisher: Springer Science & Business Media
Release Date: 2013-03-09
Investigation of the kinetic processes occurring in the atmospheric gases and low temperature plasmas of such gases is of great interest for numerous areas of modern physics and chemistry. These include discharge and laser physics, physics of the ionosphere, chemistry and optics of the atmosphere, laser and plasma chemistry, and nonequilibrium gas dynamics. Further, nonequilibrium gaseous media and low temperature plasmas formed from N2, 02, or N2-02 mixtures are rich in active components such as 0, N, and H atoms and ex cited metastable species, which fostered the utilization of such nonequilibrium systems in a variety of new technologies. At present, several monographs devoted to the analysis of kinetic pro cesses in molecular gases and plasmas are available in the literature. How ever, most of these works deal only with general physical-chemical kinetic aspects, and do not provide an analysis of basic kinetic theory and detailed investigation of kinetic processes in N2, 02 and their mixtures. A monograph devoted to such a thorough analysis for the atmospheric gases is still lacking in the literature. The present book was written to fill in this gap. The book can be considered as a natural development of two former mono graphs, Non-Equilibrium Vibrotional Kinetics (ed. by M. Capitelli, Sprin ger-Verlag 1986) and Kinetic Processes in Gases and Lasers (B. Gordiets, A.I. Osipov, and L.A. Shelepin, Gordon and Breach 1988).
Plasma Processes and Plasma Kinetics
Author: Boris M. Smirnov
language: en
Publisher: John Wiley & Sons
Release Date: 2007-04-09
This problems supplement to plasma physics textbooks covers plasma theory for both science and technology. Written by a renowned plasma scientist, experienced book author and skilled teacher, it treats all aspects of plasma theory in no fewer than 520 very detailed worked-out problems. With this systematic collection the reader will gain a sound understanding of plasma physics in all fields, from fusion and astrophysics to surface treatment. The book also includes the transport of particles as well as radiation in plasmas, and while designed for graduate students and young researchers, it can equally serve as a reference.
Lecture Notes on Principles of Plasma Processing
Author: Francis F. Chen
language: en
Publisher: Springer Science & Business Media
Release Date: 2003-01-31
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.