Physics And Modeling Of Boron Diffusion Activation And Evolution Of Extended Defects And Point Defects During Rapid Thermal Annealing Of Ion Implanted Silicon


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American Doctoral Dissertations


American Doctoral Dissertations

Author:

language: en

Publisher:

Release Date: 1993


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Laser Annealing Processes in Semiconductor Technology


Laser Annealing Processes in Semiconductor Technology

Author: Fuccio Cristiano

language: en

Publisher: Woodhead Publishing

Release Date: 2021-04-21


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Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. - Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena - Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations - Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors