Patternmaking For Fashion Design By Helen Armstrong


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Patternmaking for Fashion Design


Patternmaking for Fashion Design

Author: Helen Joseph Armstrong

language: en

Publisher:

Release Date: 2013-07-23


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For an undergraduate course in Patternmaking. Renowned for its comprehensive coverage, exceptional illustrations, and clear instructions, this #1 text offers detailed yet easy-to-understand explanations of the essence of patternmaking. Hinging on a recurring theme that all designs are based on one or more of the three major patternmaking and design principles-dart manipulation, added fullness, and contouring-it provides students with all the relevant information necessary to create design patterns with accuracy regardless of their complexity.

Draping for Apparel Design


Draping for Apparel Design

Author: Helen Joseph Armstrong

language: en

Publisher: Fairchild Books & Visuals

Release Date: 2000


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This text combines step-by-step instructions illustrated to present the principles and methods of draping. Author Helen Joseph-Armstrong incorporates three draping techniques- manipulating dart excess, adding fullness and contour draping - in design projects featured throughout the text. Projects begin with a draping plan and fashion drawing to identify its creative elements and determine the draping technique required. The author describes the drape of the basic dress and its relationship to every garment in a clothing collection.

Patternmaking for Fashion Design


Patternmaking for Fashion Design

Author: Helen Joseph-Armstrong

language: en

Publisher:

Release Date: 2000


DOWNLOAD





For an undergraduate course in Fashion. Renowned for its comprehensive coverage, exceptional illustrations, and clear instructions, This hallmark text offers detailed yet easy-to-understand explanations of the essence of patternmaking. Hinging on a recurring theme that all designs are based on one or more of the three major patternmaking and design principles dart manipulation, added fullness, and contouring it provides students with all the relevant information necessary to create design patterns with accuracy regardless of their complexity.