New Directions In Research With Third Generation Soft X Ray Synchrotron Radiation Sources

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New Directions in Research with Third-Generation Soft X-Ray Synchrotron Radiation Sources

Author: A.S. Schlachter
language: en
Publisher: Springer Science & Business Media
Release Date: 2012-12-06
Soft X-rays are a powerful probe of matter. They interact selectively with electrons in atoms and molecules and can be used to study atomic physics, chemical reactions, surfaces and solids, and biological entities. Over the past 20 years, synchrotrons have emerged as powerful sources of soft X-rays for experimental use. A new, third generation of synchrotron light sources is scheduled to start operation over the next few years, beginning in 1993. These facilities are distinguished by their ultra-low emittance electron beams and by their undulators -- precisely engineered magnetic devices that cause the electrons passing through them to produce highly coherent X-rays and ultraviolet light of unprecedented spectral brightness. This volume emphasizes third-generation sources that produce light in the 10 eV--10 KeV energy range. It describes potential applications ranging from the purely scientific to the commercially viable and includes chapters on the practical aspects of designing undulators and beam line optics. Unique in its coverage, the book is a vital addition to the library of any scientist who needs information on the world's most advanced imaging and spectroscopic techniques. (ABSTRACT) This volume emphasizes the applications of new third generation synchrotron radiation sources that produce light in the ultraviolet and soft X-ray range of the spectrum. The unprecedented brightness of this light enables experiments to be conducted with greatly increased spatial and spectral resolution. Scientists can exploit these properties for imaging and spectroscopic applications that until now were impossible or impractical. Prominent researchers in the field describe these applications and others made possible by the light's pulsed time structure and polarization. The volume also includes chapters on the practical aspects of designing undulators and beam line optics.
Soft X-Rays and Extreme Ultraviolet Radiation

Author: David Attwood
language: en
Publisher: Cambridge University Press
Release Date: 2007-02-22
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
X-Rays and Extreme Ultraviolet Radiation

Author: David Attwood
language: en
Publisher: Cambridge University Press
Release Date: 2017-02-16
With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.