Millimeter Wave Digitally Intensive Frequency Generation In Cmos


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Millimeter-Wave Digitally Intensive Frequency Generation in CMOS


Millimeter-Wave Digitally Intensive Frequency Generation in CMOS

Author: Wanghua Wu

language: en

Publisher: Academic Press

Release Date: 2015-09-23


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This book describes the digitally intensive time-domain architectures and techniques applied to millimeter-wave frequency synthesis, with the objective of improving performance and reducing the cost of implementation. Coverage includes system architecture, system level modeling, critical building block design, and digital calibration techniques, making it highly suitable for those who want to learn about mm-wave frequency generation for communication and radar applications, integrated circuit implementation, and time-domain circuit and system techniques. - Highlights the challenges of frequency synthesis at mm-wave band using CMOS technology - Compares the various approaches for mm-wave frequency generation (pros and cons) - Introduces the digitally intensive synthesizer approach and its advantages - Discusses the proper partitioning of the digitally intensive mm-wave frequency synthesizer into mm-wave, RF, analog, digital and software components - Provides detailed design techniques from system level to circuit level - Addresses system modeling, simulation techniques, design-for-test, and layout issues - Demonstrates the use of time-domain techniques for high-performance mm-wave frequency synthesis

Millimeter-Wave Circuits for 5G and Radar


Millimeter-Wave Circuits for 5G and Radar

Author: Gernot Hueber

language: en

Publisher: Cambridge University Press

Release Date: 2019-06-20


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Discover the concepts and techniques needed to design millimeter-wave circuits for current and emerging wireless system applications.

CMOS Past, Present and Future


CMOS Past, Present and Future

Author: Henry Radamson

language: en

Publisher: Woodhead Publishing

Release Date: 2018-04-03


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CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book's key approach is on characterizations, device processing and electrical measurements. - Addresses challenges and opportunities for the use of CMOS - Covers the latest methods of strain engineering, materials integration to increase mobility, nano-scaled transistor processing, and integration of CMOS with photonic components - Provides a look at the evolution of CMOS technology, including the origins of the technology, current status and future possibilities