Materials Design For Block Copolymer Lithography
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Materials Design for Block Copolymer Lithography
Block copolymers (BCPs) have attracted a great deal of scientific and technological interest due to their ability to spontaneously self-assemble into dense periodic nanostructures with a typical length scale of 5 to 50 nm. The use of self-assembled BCP thin-films as templates to form nanopatterns over large-area is referred to as BCP lithography. Directed self-assembly of BCPs is now viewed as a viable candidate for sub-20 nm lithography by the semiconductor industry. However, there are multiple aspects of assembly and materials design that need to be addressed in order for BCP lithography to be successful. These include substrate modification with polymer brushes or mats, tailoring of the block copolymer chemistry, understanding thin-film assembly and developing epitaxial like methods to control long range alignment. The rational design, synthesis and self-assembly of block copolymers with large interaction parameters (chi) is described in the first part of this dissertation. Two main blocks were chosen for introducing polarity into the BCP system, namely poly(4-hydroxystyrene) and poly(2-vinylpyridine). Each of these blocks are capable of ligating Lewis acids which can increase the etch contrast between the blocks allowing for facile pattern transfer to the underlying substrate. These BCPs were synthesized by living anionic polymerization and showed excellent control over molecular weight and dispersity, providing access to sub 5-nm domain sizes. Polymer brushes consist of a polymer chain with one end tethered to the surface and have wide applicability in tuning surface energy, forming responsive surfaces and increasing biocompatibility. In the second part of the dissertation, we present a universal method to grow dense polymer brushes on a wide range of substrates and combine this chemistry with BCP assembly to fabricate nanopatterned polymer brushes. This is the first demonstration of introducing additional functionality into a BCP directing layer and opens up a wide slew of applications from directed self-assembly to biomaterial engineering.
Semiconductor Nanoscale Devices: Materials and Design Challenges
Author: Ashish Raman, Prabhat Singh, Naveen Kumar, Ravi Ranjan
language: en
Publisher: Bentham Science Publishers
Release Date: 2025-03-14
Semiconductor Nanoscale Devices: Materials and Design Challenges provides a comprehensive exploration of nanoscale technologies and semiconductor device design, focusing on innovative materials and advanced applications. It bridges classical and quantum concepts, offering insights into foundational materials, device architectures, and future technologies like biosensors, 6G communication, and photovoltaics. The book is organized into three sections: foundational concepts, methodologies and advancements, and next-generation applications. It emphasizes practical design, analytical modeling, and optimization for real-world applications, making it a valuable resource for professionals and researchers. Key Features: - Comprehensive coverage of nanoscale semiconductor device design challenges and innovations. - Focus on advanced materials and methodologies for cutting-edge technologies. - Practical insights into measurement techniques and device optimization. - In-depth exploration of emerging applications like 6G, biosensors, and photovoltaics.
Block Copolymers II
Author: Volker Abetz
language: en
Publisher: Springer Science & Business Media
Release Date: 2005-12-02
. A.J. M ller, V. Balsamo, M.L. Arnal: Nucleation and Crystallization in Diblock and Triblock Copolymers.- 2 J.-F. Gohy: Block Copolymer Micelles.- 3 M.A. Hillmyer: Nanoporous Materials from Block Copolymer Precursors.- 4 M. Li, C. Coenjarts, C.K. Ober: Patternable Block Copolymers.-