Gate Stack And Silicide Issues In Silicon Processing


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Gate Stack and Silicide Issues in Silicon Processing


Gate Stack and Silicide Issues in Silicon Processing

Author:

language: en

Publisher:

Release Date: 2002


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High k Gate Dielectrics


High k Gate Dielectrics

Author: Michel Houssa

language: en

Publisher: CRC Press

Release Date: 2003-12-01


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The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ

Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII


Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII

Author: Ram Ekwal Sah

language: en

Publisher: The Electrochemical Society

Release Date: 2005


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