Circuit Performance Verification And Optimization In The Presence Of Variability
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Circuit Performance Verification and Optimization in the Presence of Variability
The continued scaling of digital integrated circuits has led to an increasingly larger impact of process, supply voltage, and temperature (PVT) variations. The effect of these variations on logic cell and interconnect delays has introduced challenges to both circuit performance (timing) verification and optimization. In order for us to fully take advantage of the benefits of technology scaling, it is essential that "variation-aware" techniques for performance verification and optimization be developed and used in modern design flows.In this thesis such techniques for both performance verification and optimization are presented. First, we present a fast method for finding the worst-case slacks over all process and environmental corners. This method uses the standard set of PVT corners available in industry, and provides large runtime gains while maintaining a high degree of accuracy. After that, we propose an efficient block-based parameterized timing analysis technique that can accurately capture circuit delays at every point in the parameter space, by reporting all paths that can become critical. This method employs parameterized static timing analysis (PSTA) variability models, and allows one to easily examine local robustness to parameters in different regions of the parameter space. Next, we introduce an optimization method that alters clock network lines so that a circuit meets its timing constraints at all PVT settings under PSTA variability models. This is formulated as a Linear Program (LP), which is based on a clock skew optimization formulation, and as a result it can be solved efficiently. Finally, we present a method that uses characterized, pre-silicon, PSTA variational timing models to identify speedpaths that can best explain the observed delay measurements during silicon debug. This is a crucial step, required for both "fixing"' failing paths and for accurate learning from silicon data.
Nano-CMOS Design for Manufacturability
Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.
Advanced Symbolic Analysis for VLSI Systems
This book provides comprehensive coverage of the recent advances in symbolic analysis techniques for design automation of nanometer VLSI systems. The presentation is organized in parts of fundamentals, basic implementation methods and applications for VLSI design. Topics emphasized include statistical timing and crosstalk analysis, statistical and parallel analysis, performance bound analysis and behavioral modeling for analog integrated circuits. Among the recent advances, the Binary Decision Diagram (BDD) based approaches are studied in depth. The BDD-based hierarchical symbolic analysis approaches, have essentially broken the analog circuit size barrier.