Ab Initio Molecular Dynamics Simulation Of Diffusion In Silicon


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Ab Initio Molecular Dynamics Simulation of Diffusion in Silicon


Ab Initio Molecular Dynamics Simulation of Diffusion in Silicon

Author: Beat Sahli

language: en

Publisher:

Release Date: 2007


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Ab Initio Molecular Dynamics


Ab Initio Molecular Dynamics

Author: Dominik Marx

language: en

Publisher: Cambridge University Press

Release Date: 2009-04-30


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Ab initio molecular dynamics revolutionized the field of realistic computer simulation of complex molecular systems and processes, including chemical reactions, by unifying molecular dynamics and electronic structure theory. This book provides the first coherent presentation of this rapidly growing field, covering a vast range of methods and their applications, from basic theory to advanced methods. This fascinating text for graduate students and researchers contains systematic derivations of various ab initio molecular dynamics techniques to enable readers to understand and assess the merits and drawbacks of commonly used methods. It also discusses the special features of the widely used Car–Parrinello approach, correcting various misconceptions currently found in research literature. The book contains pseudo-code and program layout for typical plane wave electronic structure codes, allowing newcomers to the field to understand commonly used program packages and enabling developers to improve and add new features in their code.

C, H, N and O in Si and Characterization and Simulation of Materials and Processes


C, H, N and O in Si and Characterization and Simulation of Materials and Processes

Author: A. Borghesi

language: en

Publisher: Newnes

Release Date: 2012-12-02


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Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry.The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.